Submicron microdevice patterning with plasma-thinned nail-polish microfiber shadow masks
Published in Nanoscale Advances, 2026
This work introduces nail-polish microfibers as accessible shadow masks for fabricating microdevices. Oxygen-plasma thinning enables submicron electrode gaps without photolithography. The method is demonstrated with MoS₂ field-effect transistors and photodetectors on rigid and flexible substrates.
Article type: Research Article · Access: Open access
Corresponding authors: Yong Xie and Andres Castellanos-Gomez
Recommended citation: Yong Xie, Qianjie Lei, Nuria Jiménez-Arévalo, Esteban Zamora-Amo, Thomas Pucher, Andres Castellanos-Gomez. (2026). "Submicron microdevice patterning with plasma-thinned nail-polish microfiber shadow masks." Nanoscale Advances. DOI: 10.1039/d6na00537c.